| View Larger Image | Characterization and Metrology for Nanoelectronics: 2007 International Conference on Frontiers of Characterization and Metrology (AIP Conference Proceedings / Materials Physics and Applications) | Hardcoverby David G. Seiler (Author), David G. Seiler (Editor), Alain C. Diebold (Editor), Robert McDonald (Editor), C. Michael Garner (Editor), Dan Herr (Editor), Rajinder P. Khosla (Editor), Erik M. Secula (Editor)
| List Price: | $179.00 | | | Available: | Usually ships in 24 hours |
| | Binding: | Hardcover | | Publisher: | American Institute of Physics | | Edition: | 1st Edition | | Page Count: | 592 Pages | | Publication Date: | September 26, 2007 | | Sales Rank: | 1,871,429st |
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EDITORIAL REVIEWS |
Product Description
All papers have been peer-reviewed. As the semiconductor industry continues to move toward silicon nanoelectronics and beyond, the introduction of new materials, innovative processing and assembly, and novel devices brings formidable metrology challenges. We have entered an era where nanotechnology is required to meet the demand for smaller, faster, cheaper, and more complex functional chips. Innovative metrology and characterization methods have become critical. This book emphasizes the frontiers of innovation in the characterization and metrology needed to advance nanoelectronics. It comprises applications in nanoelectronic materials and devices, research and development,and manufacturing and diagnostics. Novel characterization methods for beyond CMOS and extreme CMOS devices are addressed, as well as electrical measurements, gate dielectrics, interconnects, lithography, microscopy, and scanning probes. The Editors believe that this book of collected papers from world-class leaders provides a basis and effective portrayal of the industry s characterization and metrology needs and how they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductors into the nanoelectronic regime. It also provides a foundation for stimulating further advances in metrology and new ideas for research and development. |
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