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| View Larger Image | Electromigration: Studied with the Optical Microscopy Imaging Method | Paperbackby Linghong Li (Author)
| List Price: | $67.04 | | | Available: | Usually ships in 24 hours |
| | Binding: | Paperback | | Publisher: | VDM Verlag | | Page Count: | 76 Pages | | Publication Date: | October 10, 2008 |
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EDITORIAL REVIEWS |
Product Description
Electromigration is a microscopic phenomenon involving electric field-induced diffusion, which is very relevant to damage in interconnections. A common method for monitoring interconnection degradation is through electrical resistance measurements, which requires direct electrical contact. It is desirable to develop non-contact methods to monitor electromigration damage formation. In this thesis, we propose a novel Optical Microscopy Imaging Method (OMIM), and we provide a theoretical description and experimental results. OMIM not only provides a new method for studying electromigration, but also provides a useful method for studying other micro-devices and materials in a non- contact mode. |
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