Materials Today, May 2003April 23, 2003-------------------------- This month's features -------------------------- The fabrication of materials and devices on the nanoscale may require a new approach * Shuguang Zhang of MIT is following nature's example and building materials from the bottom up. * Materials Today investigates the latest developments in extreme UV lithography and the potential of dip-pen nanolithography, which could provide an easy and affordable means to pattern surfaces on the submicron-scale. * Wolfgang Arden of Infineon outlines the key challenges in the latest update of the semiconductor industry roadmap. ****************************************** ****************************************** ------- ------------------- | |||||||||||||||||||||
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