Science Current Events | Science News | Brightsurf.com
 
Email a Friend Send to a friend
Printer Friendly Print New design for transistors powered by single electrons

New design for transistors powered by single electrons

February 03, 2006

Scientists have demonstrated the first reproducible, controllable silicon transistors that are turned on and off by the motion of individual electrons. The experimental devices, designed and fabricated at NTT Corp. of Japan and tested at NIST, may have applications in low-power nanoelectronics, particularly as next-generation integrated circuits for logic operations (as opposed to simpler memory tasks).

The transistors, described in the Jan. 30, 2006, issue of Applied Physics Letters,* are based on the principle that as device sizes shrink to the nanometer range, the amount of energy required to move a single electron increases significantly. This makes it possible to control individual electron motion and current flow by manipulating the voltage applied to barriers, or "gates," in the electrical circuit. At negative voltage, the transistor is off; at higher voltage, the transistor is turned on and individual electrons file through the circuit, as opposed to thousands at a time in a conventional device.




This type of innovative transistor, called a "single-electron tunneling" (SET) device, is typically made with a metal "wire" interrupted by insulating barriers that offer a rigid, narrow range of control over electron flow. Silicon devices, by contrast, have barriers that are electrically "tunable" over a wider operating range, offering finer, more flexible control of the transistor's on/off switch. Particular voltage levels are applied across the barriers, to manipulate charge, as a means of encouraging or impeding electron flow. Silicon-based devices also allow fabrication using standard semiconductor technology. Until now, however, no silicon SET transistor designs have been reported that are reproducible and controllable.

The NIST/NTT team made five uniform, working silicon transistors with tunable barriers. Each device consists of a silicon channel 360 nanometers (nm) long and 30 nm wide, with three gates crossing the channel. The gates have two levels; the upper level turns the current on and off, while the lower level controls electron flow in small local areas. The team was able to tune gate conductance properties over a wide range, by more than three orders of magnitude.

National Institute of Standards and Technology (NIST)



Related Silicon Transistor Current Events and Silicon Transistor News Articles
Rensselaer student invents alternative to silicon chip
Even before Weixiao Huang received his doctorate from Rensselaer Polytechnic Institute, his new transistor captured the attention of some of the biggest American and Japanese automobile companies.
More Silicon Transistor Current Events and Silicon Transistor News Articles
HSE-3004949-001

HSE-3004949-001
by American Microsemiconductor

HSE-3004949-001 Military/High-Rel:NV(BR)CEO (V):55V(BR)CBO (V):90I(C) Max. (A):4.0Absolute Max. Power Diss. (W):25#Maximum Operating Temp (øC):200#I(CBO) Max. (A):5.0m÷@V(CBO) (V) (Test Condition):100V(CE)sat Max. (V):6.0@I(C) (A) (Test Condition):3.0@I(B) (A) (Test Condition):1.0h(FE) Min. Current gain.:25h(FE) Max. Current gain.:75@I(C) (A) (Test Condition):500m@V(CE) (V) (Test Condition):4.0f(T) Min. (Hz) Transition Freq:30k@I(C) (A) (Test Condition):100m@V(CE) (V) (Test Condition):4.0Package Style:TO-3Mounting Style:TMany Values Availableí Nota Bene: Image is not true representation of part Nota Bene: Image is not true representation of...

  Thin Film Transistors: Materials and ProcessesVolume 1: Amorphous Silicon Thin Film TransistorsVolume 2: Polycrystalline Silicon Thin Transistors (v. 1)
by Yue Kuo (Editor)

This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si:H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si:H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si:H TFT operations and unique material characteristics. Readers are also exposed to a wide...

  Toshiba 72794577 TRANSISTOR SILICON
by Toshiba

SILICON TRANSISTOR

2N5981-PKG-VAR

2N5981-PKG-VAR
by American Microsemiconductor

2N5981-PKG-VAR Military/High-Rel:NV(BR)CEO (V):40V(BR)CBO (V):60I(C) Max. (A):12Absolute Max. Power Diss. (W):100#Maximum Operating Temp (øC):150õI(CBO) Max. (A):2.0mذ@V(CBO) (V) (Test Condition):20V(CE)sat Max. (V):1.7@I(C) (A) (Test Condition):12@I(B) (A) (Test Condition):1.8h(FE) Min. Current gain.:20h(FE) Max. Current gain.:120@I(C) (A) (Test Condition):6.0@V(CE) (V) (Test Condition):2.0f(T) Min. (Hz) Transition Freq:2.0M@I(C) (A) (Test Condition):500m@V(CE) (V) (Test Condition):10Package Style:TO-127varMounting Style:T Nota Bene: Image is not true representation of part Nota Bene: Image is not true representation of...

2N5977-PKG-VAR

2N5977-PKG-VAR
by American Microsemiconductor

2N5977-PKG-VAR Military/High-Rel:NV(BR)CEO (V):40V(BR)CBO (V):60I(C) Max. (A):12Absolute Max. Power Diss. (W):100#Maximum Operating Temp (øC):150õI(CBO) Max. (A):2.0mذ@V(CBO) (V) (Test Condition):20V(CE)sat Max. (V):1.7@I(C) (A) (Test Condition):12@I(B) (A) (Test Condition):1.8h(FE) Min. Current gain.:20h(FE) Max. Current gain.:120@I(C) (A) (Test Condition):6.0@V(CE) (V) (Test Condition):2.0f(T) Min. (Hz) Transition Freq:2.0M@I(C) (A) (Test Condition):500m@V(CE) (V) (Test Condition):10Package Style:TO-127varMounting Style:T Nota Bene: Image is not true representation of part Nota Bene: Image is not true representation of...

  ELECTRONIC CERAMICS: IBM Makes Smallest Silicon Transistor.: An article from: High Tech Ceramics News
by Business Communications Company, Inc. (Publisher)

This digital document is an article from High Tech Ceramics News, published by Business Communications Company, Inc. on December 1, 2002. The length of the article is 549 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.

Citation Details
Title: ELECTRONIC CERAMICS: IBM Makes Smallest Silicon Transistor.
Publication: High Tech Ceramics News (Newsletter)
Date: December 1, 2002
Publisher: Business Communications Company, Inc.
Volume: 14 Issue: 8

Distributed by Thomson...

MJE5978-PKG-VAR

MJE5978-PKG-VAR
by American Microsemiconductor

MJE5978-PKG-VAR Military/High-Rel:NV(BR)CEO (V):40V(BR)CBO (V):60I(C) Max. (A):12Absolute Max. Power Diss. (W):100#Maximum Operating Temp (øC):150õI(CBO) Max. (A):2.0mذ@V(CBO) (V) (Test Condition):20V(CE)sat Max. (V):1.7@I(C) (A) (Test Condition):12@I(B) (A) (Test Condition):1.8h(FE) Min. Current gain.:20h(FE) Max. Current gain.:120@I(C) (A) (Test Condition):6.0@V(CE) (V) (Test Condition):2.0f(T) Min. (Hz) Transition Freq:2.0M@I(C) (A) (Test Condition):500m@V(CE) (V) (Test Condition):10Package Style:TO-127varMounting Style:T Nota Bene: Image is not true representation of part Nota Bene: Image is not true representation of...

  Silicon Germanium Heterojunction Bipolar Transistors: Large-Signal Modeling and Low-Frequency Noise Characterization Aspects (Comprehensive Summaries of ... the Faculty of Science and Technology, 479)
by Staffan Bruce (Author)



MJE5974-PKG-VAR

MJE5974-PKG-VAR
by American Microsemiconductor

MJE5974-PKG-VAR Military/High-Rel:NV(BR)CEO (V):40V(BR)CBO (V):60I(C) Max. (A):12Absolute Max. Power Diss. (W):100#Maximum Operating Temp (øC):150õI(CBO) Max. (A):2.0mذ@V(CBO) (V) (Test Condition):20V(CE)sat Max. (V):1.7@I(C) (A) (Test Condition):12@I(B) (A) (Test Condition):1.8h(FE) Min. Current gain.:20h(FE) Max. Current gain.:120@I(C) (A) (Test Condition):6.0@V(CE) (V) (Test Condition):2.0f(T) Min. (Hz) Transition Freq:2.0M@I(C) (A) (Test Condition):500m@V(CE) (V) (Test Condition):10Package Style:TO-127varMounting Style:T Nota Bene: Image is not true representation of part Nota Bene: Image is not true representation of...

2N5975-PKG-VAR

2N5975-PKG-VAR
by American Microsemiconductor

2N5975-PKG-VAR Military/High-Rel:NV(BR)CEO (V):40V(BR)CBO (V):60I(C) Max. (A):12Absolute Max. Power Diss. (W):100#Maximum Operating Temp (øC):150õI(CBO) Max. (A):2.0mذ@V(CBO) (V) (Test Condition):20V(CE)sat Max. (V):1.7@I(C) (A) (Test Condition):12@I(B) (A) (Test Condition):1.8h(FE) Min. Current gain.:20h(FE) Max. Current gain.:120@I(C) (A) (Test Condition):6.0@V(CE) (V) (Test Condition):2.0f(T) Min. (Hz) Transition Freq:2.0M@I(C) (A) (Test Condition):500m@V(CE) (V) (Test Condition):10Package Style:TO-127varMounting Style:T Nota Bene: Image is not true representation of part Nota Bene: Image is not true representation of...

© 2009 BrightSurf.com