New Laser Technique Advances Nanofabrication ProcessApril 10, 2009COLLEGE PARK, Md. -- The ability to create tiny patterns is essential to the fabrication of computer chips and many other current and potential applications of nanotechnology. Yet, creating ever smaller features, through a widely-used process called photolithography, has required the use of ultraviolet light, which is difficult and expensive to work with. John Fourkas, Professor of Chemistry and Biochemistry in the University of Maryland College of Chemical and Life Sciences, and his research group have developed a new, table-top technique called RAPID (Resolution Augmentation through Photo-Induced Deactivation) lithography that makes it possible to create small features without the use of ultraviolet light. This research is to be published in Science magazine and released on Science Express on April 9, 2009. Photolithography uses light to deposit or remove material and create patterns on a surface. There is usually a direct relationship between the wavelength of light used and the feature size created. Therefore, nanofabrication has depended on short wavelength ultraviolet light to generate ever smaller features. "The RAPID lithography technique we have developed enables us to create patterns twenty times smaller than the wavelength of light employed,"explains Dr. Fourkas, "which means that it streamlines the nanofabrication process. We expect RAPID to find many applications in areas such as electronics, optics, and biomedical devices." "If you have gotten a filling at the dentist in recent years,"says Fourkas, "you have seen that a viscous liquid is squirted into the cavity and a blue light is then used to harden it. A similar process of hardening using light is the first element of RAPID. Now imagine that your dentist could use a second light source to sculpt the filling by preventing it from hardening in certain places. We have developed a way of using a second light source to perform this sculpting, and it allows us to create features that are 2500 times smaller than the width of a human hair." Both of the laser light sources used by Fourkas and his team were of the same color, the only difference being that the laser used to harden the material produced short bursts of light while the laser used to prevent hardening was on constantly. The second laser beam also passed through a special optic that allowed for sculpting of the hardened features in the desired shape. "The fact that one laser is on constantly in RAPID makes this technique particularly easy to implement,"says Fourkas, "because there is no need to control the timing between two different pulsed lasers." Fourkas and his team are currently working on improvements to RAPID lithography that they believe will make it possible to create features that are half of the size of the ones they have demonstrated to date. University of Maryland |
|||||||||||||||||||||
| Related Photolithography Current Events and Photolithography News Articles Caltech scientists solve decade-long mystery of nanopillar formations Scientists at the California Institute of Technology (Caltech) have uncovered the physical mechanism by which arrays of nanoscale (billionths-of-a-meter) pillars can be grown on polymer films with very high precision, in potentially limitless patterns. Micropatterned material surface controls cell orientation Cells could be orientated in a controlled way on a micro-patterned surface based upon a delicate material technique, and the orientation could be semi-quantitatively described by some statistical parameters. Graphitic memory techniques advance at Rice Advances by the Rice University lab of James Tour have brought graphite's potential as a mass data storage medium a step closer to reality and created the potential for reprogrammable gate arrays that could bring about a revolution in integrated circuit logic design. Nuclear fusion research key to advancing computer chips Researchers are adapting the same methods used in fusion-energy research to create extremely thin plasma beams for a new class of "nanolithography" required to make future computer chips. Bioengineers develop a microfabricated device to measure cellular forces during tissue development A University of Pennsylvania-collaboration of bioengineers studying the physical forces generated by individual cells has created a tiny micron-sized device that allows researchers to measure and manipulate cellular forces as assemblies of living cells reorganize themselves into tissues. NIST-Cornell Team Builds World's First Nanofluidic Device with Complex 3-D Surfaces Researchers at the Commerce Department's National Institute of Standards and Technology (NIST) and Cornell University have capitalized on a process for manufacturing integrated circuits at the nanometer (billionth of a meter) level and used it to develop a method for engineering the first-ever nanoscale fluidic (nanofluidic) device with complex three-dimensional surfaces. Wireless microgrippers grab living cells in 'biopsy' tests In experiments that pave the way for tiny mobile surgical tools activated by heat or chemicals, Johns Hopkins researchers have invented dust-particle-size devices that can be used to grab and remove living cells from hard-to-reach places without the need for electrical wires, tubes or batteries. Instead, the devices are actuated by thermal or biochemical signals. Denser computer chips possible with plasmonic lenses that 'fly' Engineers at the University of California, Berkeley, are reporting a new way of creating computer chips that could revitalize optical lithography, a patterning technique that dominates modern integrated circuits manufacturing. New nanoscale process created by UCSB scientists will help computers run faster and more efficiently Smaller. Faster. More efficient. These are the qualities that drive science and industry to create new nanoscale structures that will help to speed up computers. Scientists demonstrate method for integrating nanowire devices directly onto silicon Applied scientists at Harvard University in collaboration with researchers from the German universities of Jena, Gottingen, and Bremen, have developed a new technique for fabricating nanowire photonic and electronic integrated circuits that may one day be suitable for high-volume commercial production. More Photolithography Current Events and Photolithography News Articles |
|||||||||||||||||||||
|
|||||||||||||||||||||
|
|||||||||||||||||||||