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Making a good impression: Nanoimprint lithography tests at NIST
In what should be good news for integrated circuit manufacturers, recent studies by the National Institute of Standards and Technology (NIST) have helped resolve two important questions about an emerging microcircuit manufacturing technology called nanoimprint lithography-yes, it can accurately stamp delicate insulating structures on advanced... view more... (2008-04-30)
Researchers develop detailed design rules for nanoimprint lithography processing
Using a combination of experimental data and simulations, researchers have identified key parameters that predict the outcome of nanoimprint lithography, a fabrication technique that offers an alternative to traditional lithography in patterning integrated circuits and other small-scale structures into polymers. view more (2006-04-24)
New polymers for applications in nanopatterning and nanolithography
The Cidetec Technological Centre continues to invest in nanotechnology development with its participation in the European NAPA (Emerging Nanopatterning Methods) project. The research institution is directing a working subgroup to develop new thermoplastic polymers for applications in nanopatterning and nanolithography. view more (2005-04-19)
Breakthrough Computer Chip Lithography Method Developed at RIT
A new computer chip lithography method under development at Rochester Institute of Technology has led to imaging capabilities beyond that previously thought possible. view more (2006-02-13)
Research removes major obstacle from mass production of tiny circuits
As they eliminate tiny air bubbles that form when liquid droplets are molded into intricate circuits, a Princeton-led team is dissolving a sizable obstacle to the mass production of smaller, cheaper microchips. view more (2007-01-18)
New 'liquid lens' data for immersion lithography
New data on the properties of potential "liquid lenses" compiled by the National Institute of Standards and Technology (NIST) could help the semiconductor industry continue to shrink feature sizes on computer chips. view more (2006-03-21)
New Laser Technique Advances Nanofabrication Process
The ability to create tiny patterns is essential to the fabrication of computer chips and many other current and potential applications of nanotechnology. view more (2009-04-10)
Lighter gas reduces damage to optics in extreme ultraviolet lithography
Researchers at the University of Illinois have discovered a way to generate light and reduce damage in a leading candidate for next-generation microelectronics lithography. The technique could help pack more power into smaller computer chips. view more (2007-09-13)
Denser computer chips possible with plasmonic lenses that 'fly'
Engineers at the University of California, Berkeley, are reporting a new way of creating computer chips that could revitalize optical lithography, a patterning technique that dominates modern integrated circuits manufacturing. view more (2008-10-23)
Nuclear fusion research key to advancing computer chips
Researchers are adapting the same methods used in fusion-energy research to create extremely thin plasma beams for a new class of "nanolithography" required to make future computer chips. view more (2009-08-19)
Photonic Crystals in 3-D - The Physics Congress 2003
Telecoms systems contain an awkward mixture of optics and electronics. A purely optical system would permit the very high data rates needed by the Internet, but at the moment the switching and routing, as well as the "last mile" to the customer, still depend on slower electronic components. Speaking at the Institute of Physics Congress... view more... (2003-03-17)
Guiding light - CMD19/CMMP with The Physics Congress 2002
A new type of optical material has been developed by physicists that could replace the electronics used to route the light signals through optical fibre telecommunications networks. It could even provide the basis for future `optical computers` working on light pulses instead of electric signals. At the Condensed Matter conference on Monday 8... view more... (2002-03-26)
Self-assembling polymer arrays improve data storage potential
A new manufacturing approach holds the potential to overcome the technological limitations currently facing the microelectronics and data-storage industries, paving the way to smaller electronic devices and higher-capacity hard drives. view more (2008-08-15)
NIST demos industrial-grade nanowire device fabrication
In the growing catalog of nanoscale technologies, nanowires-tiny rows of conductor or semiconductor atoms-have attracted a great deal of interest for their potential to build unique atomic-scale electronics. view more (2007-10-29)
Light for the next generation of chips
The semiconductor industry is on the verge of a major technological breakthrough. From 2009 onwards, circuits will be created by exposure to extreme ultraviolet (EUV) rays. Researchers from Aachen were awarded the Stifterverband Science Prize - not only for their EUV source. view more (2004-11-09)
A new technique for building nanodevices in the lab
Physicists at the University of Pennsylvania are using a new technique to craft some of the tiniest metal nanostructures ever created, none larger than 10 nanometers, or 10,000 times smaller than the width of a single human hair. view more (2007-06-26)
From 2-D blueprint, material assembles into novel 3-D nanostructures
An international team of scientists affiliated with the University of Wisconsin-Madison Nanoscale Science and Engineering Center has coaxed a self-assembling material into forming never-before-seen, three-dimensional nanoscale structures, with potential applications ranging from catalysis and chemical separation to semiconductor manufacturing. view more (2006-01-30)
Using catalysts to stamp nanopatterns without ink
Using enzymes from E. coli bacteria, Duke University chemists and engineers have introduced a hundred-fold improvement in the precision of features imprinted to create microdevices such as labs-on-a-chip. view more (2007-09-27)
Junior award for bronze structures
The German Society of Electroplating and Surface Technology (Deutsche Gesellschaft für Galvano- und Oberfl'¤chentechnik e.V., DGO,) has honoured Dipl.-Ing. Gabriele Goet with the DGO-Award 2002. The prize is awarded once a year for valuable scientific contributions in the fields of electroplating and surface technology. Gabriele Goet is... view more... (2002-11-28)
MIT sculpts 3-D particles with light
MIT engineers have used ultraviolet light to sculpt three-dimensional microparticles that could have many applications in medical diagnostics and tissue engineering. view more (2007-12-04)
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