Articles tagged with Optical Lithography
Researchers at the University of Utah have developed a new method of 3D printing that creates shapes with voids using a nanoscale 'mask' that diffracts laser light. The process takes as little as 7.5 seconds, a significant improvement over traditional laser-based printing methods.
A redesigned high-NA EUV lithography optical system has been proposed, which could enable the manufacture of smaller computer chips at lower cost than current methods. The new design eliminates troublesome optical effects, enhances resolution, and should be much cheaper to produce.
Researchers at Sun Yat-sen University create a new method for fabricating ultra-uniform surface structures with features as small as 46 nanometers. The technique uses a carefully tuned femtosecond laser under water immersion, overcoming the challenge of creating uniform nanostructures smaller than 100 nanometers.
Researchers developed a compact, solid-state laser system that generates 193-nm coherent light, marking the first 193-nm vortex beam produced from a solid-state laser. This innovation enhances semiconductor lithography efficiency and opens new avenues for advanced manufacturing techniques.
The Nick Cobb Memorial Scholarship honors an exemplary graduate student in the field of lithography. Clay Klein, a PhD candidate at JILA and the University of Colorado, Boulder, will receive the $10,000 award for his research on EUV scatterometry and its applications.
HKUST researchers created the world's first deep-ultraviolet microLED display array for lithography machines, showcasing enhanced efficiency and viability of maskless photolithography. The innovation features smaller device size, lower driving voltage, higher external quantum efficiency, and larger display resolution.
A new type of cationic epoxy photoresist exhibits greater sensitivity to two-photon laser exposure, enabling fast writing speeds and fine features. The material was developed by a research team led by Professor Cuifang Kuang, who achieved lithography speeds of 100 mm/s and resolution of 170 nm.
Scientists use a compact tabletop EUV source to generate directional and spatially moderately coherent illumination for reconstruction in diffractive imaging. This approach enables high-resolution defect identification without relying on expensive imaging systems.
The team achieves nanofabrication of nanostructures buried deep inside silicon wafers, enabling sub-wavelength and multi-dimensional control directly inside the material. The breakthrough opens up new possibilities for developing nano-scale systems with unique architectures.
Researchers created a topological quantum simulator device that operates at room temperature, allowing for the study of fundamental nature of matter and light. The device has the potential to support the development of more efficient lasers.
Researchers have developed a method called mask wafer co-optimization (MWCO) that allows for the creation of curved shapes using variable-shaped beam mask writers. This technique reduces wafer variation by 3x and improves the process window by 2x compared to existing methods.
Researchers have developed a low-cost and user-friendly technique called UV-LED-based microscope projection photolithography (MPP) for rapid high-resolution manufacturing of optical elements. This approach can fabricate features down to 85 nm, comparable to expensive methods like multi-photon and electron beam lithography.
Scientists have developed a low-cost and user-friendly technique called UV-LED-based microscope projection photolithography (MPP) for rapid high-resolution manufacturing of optical elements. MPP can fabricate microfluidic devices, biosensors, and other optical devices with feature sizes down to 85 nm.
Researchers at Xi'an Jiaotong-Liverpool University have developed a sensitive and robust pH sensor that can detect pH variation in just a few microliters of samples. The new sensor uses novel materials and methods to overcome the current method's limitations, which are not sensitive enough or fragile for commercial-scale use.
The company will use the funding to develop a novel method to produce high-accuracy optical encoders, which are crucial for modern automation and robotics systems. The goal is to enable the manufacturing of complex next-generation products with precision positioning and motion control.
Researchers develop novel photoresist system with modified tannic acid to form metal patterns, offering applications in devices assembly. The method avoids poor stability and dispersion of metal nanoparticles, making it a promising approach for micro-nano metal pattern formation.
Researchers developed an in-situ monitoring approach to improve the precision of two-photon lithography fabrication, enabling high-fidelity synthesis of structured tissue scaffolds. The algorithm enhances optical sectioning ability and eliminates background noise for real-time layer-by-layer supervision.
A research team from Taiwan has found a way to massively speed up aerial image simulations using wavelength scaling and fast Fourier transformation. The new algorithm improves computation speed by 4000-5000 times while maintaining only a slight intensity deviation.
Researchers at the University of Illinois have developed a new procedure, SCRIBE, that enables precise printing of microdevices into existing materials. The technique uses multiphoton lithography to selectively modify regions of the material's interior and manufacture custom small-scale optical devices.
Researchers at Shenzhen University have developed a compact fiber optical nanomechanical probe (FONP) to measure in vivo biomechanical properties of tissue and even single cells. The high-precision mechanical sensing system enables accurate measurements with spring constants as low as 2.1 nanonewtons.
Scientists develop two-beam ultrafast laser scribing technology to fabricate ultrafine graphene patterns with sub-diffraction feature size. The technique overcomes the diffraction limit barrier, allowing for precise control over patterned structures.
A new parallel peripheral-photoinhibition lithography system has been developed, enabling the fabrication of subdiffraction-limit features with high efficiency. The system uses two beams to excite and inhibit polymerization, allowing for nonperiodic and complex patterns to be printed simultaneously.
Scientists have developed a novel fabrication method for large-area and high-precision aspheric micro-lens arrays via single beam exposure DLWL, enabling high flexibility in design. The approach produces AMLA with dimensions of 30 × 30 mm² within 8 hours, exceeding 100 mm²/h writing speed.
Researchers have developed a method for centimeter-scale color printing using grayscale laser writing, achieving vivid and fine-tunable colors. The technique leverages pixelated optical cavities to generate transmission colors with a transmission efficiency of 39-50%.
Researchers developed a novel method to create deep nanochannels in hard and brittle materials like silica, diamond, and sapphire. By employing femtosecond laser direct writing technology, they achieved sub-100-nm feature sizes and ultrahigh aspect ratios.
Researchers developed a metasurface device with three working modes, exploiting nanostructures to manipulate light and create holographic or structural-color nanoprinting images. The device offers two layers of security for anticounterfeiting measures, providing a simple yet effective approach to fight against counterfeiting.
A team of scientists has developed a novel fabrication method for aspheric micro-lens arrays, enabling large-area and high-precision creation. The single beam exposure DLWL technology satisfies the high optical performance requirements.
Researchers characterize material properties of IP-Q using Raman spectroscopy and nanoindentation, revealing elastic parameters and their effects on acoustic behavior. The study optimizes elastic parameters for TPP-fabricated structures, benefiting applications in life science, mobility, and industry.
Customized fibers have been engineered to generate Bessel beams, opening up new applications in imaging and communications. The fibers use a technique called two-photon lithography to fabricate special beam-shaping elements, enabling the creation of compact Bessel beam generators.
Researchers at Rice University have created a 'metalens' that transforms long-wave UV-A into a focused output of vacuum UV radiation. The technology uses nanophotonics to impart a phase shift on incoming light, redirecting it and generating VUV without the need for specialized equipment.
Researchers developed a novel approach combining interference lithography and grayscale-patterned secondary exposure to create high-throughput nanopatterning on a wafer-scale area. This method enables precise control of feature sizes, overcoming challenges in mainstream approaches.
Researchers developed a new framework to extract meaningful vectorial metrics from Mueller matrix elements, providing insights into exotic material characterization and precise cancer boundary detection. The framework establishes a universal metric for calculating different physical properties of target objects.
Scientists at KIT integrate a microfluidic chamber into a 3D laser lithography device to produce multi-colored, fluorescent security features from seven different materials. The system enables precise production of three-dimensional microstructured security features for applications such as banknote and document counterfeiting.
Chinese scientists have developed a facile approach for the rapid and maskless fabrication of bio-inspired hierarchical structures using multi-beam laser interference. This technique enables the creation of large-area, low-cost, and high-volume 3D fabrication of micro and nanostructures. The method is simple and efficient compared to c...
Researchers at MIT have achieved a significant advance in nanoscale lithographic technology, enabling the creation of finer patterns of lines over larger areas. The new technique has the potential to lead to commercialization of many new nanotechnology inventions that have languished due to manufacturing limitations.
A new computer chip lithography method, evanescent wave lithography (EWL), has been developed at Rochester Institute of Technology, allowing for optically imaging the smallest-ever semiconductor device geometry. The breakthrough has enabled resolution smaller than one-twentieth the wavelength of visible light, surpassing previous limits.
Soft lithography enables fabrication of silicon thin-film transistors on curved substrates with conformable patterning. The technique overcomes photolithography limitations for large-format and unconventional materials applications.
The Sandia invention enables research development of EUV lithography, patterning faster and more memory-dense microchips. This light source is brighter than synchrotron radiation and takes less space.