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Redesigned high-NA lithography optical system aims to revolutionize semiconductor chipmaking

A redesigned high-NA EUV lithography optical system has been proposed, which could enable the manufacture of smaller computer chips at lower cost than current methods. The new design eliminates troublesome optical effects, enhances resolution, and should be much cheaper to produce.

SourceOkinawa Institute of Science and Technology (OIST) Graduate University·JournalJournal of Micro/Nanopatterning Materials and Metrology·DateJun 17, 2026
Celestron NexStar 8SE Computerized Telescope

Celestron NexStar 8SE Computerized Telescope combines portable Schmidt-Cassegrain optics with GoTo pointing for outreach nights and field campaigns.

Scientists use single-step laser ablation to fabricate ultra-uniform structures smaller than 50 nanometers

Researchers at Sun Yat-sen University create a new method for fabricating ultra-uniform surface structures with features as small as 46 nanometers. The technique uses a carefully tuned femtosecond laser under water immersion, overcoming the challenge of creating uniform nanostructures smaller than 100 nanometers.

SourceInternational Journal of Extreme Manufacturing·JournalInternational Journal of Extreme Manufacturing·DateOct 16, 2025

Breakthrough in deep ultraviolet laser technology

Researchers developed a compact, solid-state laser system that generates 193-nm coherent light, marking the first 193-nm vortex beam produced from a solid-state laser. This innovation enhances semiconductor lithography efficiency and opens new avenues for advanced manufacturing techniques.

SourceSPIE--International Society for Optics and Photonics·JournalAdvanced Photonics Nexus·DateMar 21, 2025

Clay Klein named as 2025 recipient of Nick Cobb Memorial Scholarship

The Nick Cobb Memorial Scholarship honors an exemplary graduate student in the field of lithography. Clay Klein, a PhD candidate at JILA and the University of Colorado, Boulder, will receive the $10,000 award for his research on EUV scatterometry and its applications.

SourceSPIE--International Society for Optics and Photonics·DateJan 14, 2025

HKUST engineering researchers develop world’s first deep-UV microLED display chips for maskless photolithography

HKUST researchers created the world's first deep-ultraviolet microLED display array for lithography machines, showcasing enhanced efficiency and viability of maskless photolithography. The innovation features smaller device size, lower driving voltage, higher external quantum efficiency, and larger display resolution.

SourceHong Kong University of Science and Technology·JournalNature Photonics·TypeExperimental study·DateDec 29, 2024

Accelerating 3D nanofabrication using a sensitive cationic photoresist

A new type of cationic epoxy photoresist exhibits greater sensitivity to two-photon laser exposure, enabling fast writing speeds and fine features. The material was developed by a research team led by Professor Cuifang Kuang, who achieved lithography speeds of 100 mm/s and resolution of 170 nm.

SourceCactus Communications·JournalAdvanced Functional Materials·TypeExperimental study·DateOct 30, 2024
SAMSUNG T9 Portable SSD 2TB

SAMSUNG T9 Portable SSD 2TB transfers large imagery and model outputs quickly between field laptops, lab workstations, and secure archives.

Breaking through silicon

The team achieves nanofabrication of nanostructures buried deep inside silicon wafers, enabling sub-wavelength and multi-dimensional control directly inside the material. The breakthrough opens up new possibilities for developing nano-scale systems with unique architectures.

SourceBilkent University Faculty of Science·JournalNature Communications·TypeExperimental study·DateJul 16, 2024
Apple iPhone 17 Pro

Apple iPhone 17 Pro delivers top performance and advanced cameras for field documentation, data collection, and secure research communications.

Throwing lithography a curve

Researchers have developed a method called mask wafer co-optimization (MWCO) that allows for the creation of curved shapes using variable-shaped beam mask writers. This technique reduces wafer variation by 3x and improves the process window by 2x compared to existing methods.

SourceSPIE--International Society for Optics and Photonics·JournalJournal of Micro/Nanopatterning Materials and Metrology·DateFeb 20, 2024

Low-cost microscope projection photolithography system for high-resolution fabrication

Researchers have developed a low-cost and user-friendly technique called UV-LED-based microscope projection photolithography (MPP) for rapid high-resolution manufacturing of optical elements. This approach can fabricate features down to 85 nm, comparable to expensive methods like multi-photon and electron beam lithography.

SourceLight Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS·JournalLight: Advanced Manufacturing·DateJan 4, 2024

Low-cost microscope projection photolithography system for high-resolution fabrication

Scientists have developed a low-cost and user-friendly technique called UV-LED-based microscope projection photolithography (MPP) for rapid high-resolution manufacturing of optical elements. MPP can fabricate microfluidic devices, biosensors, and other optical devices with feature sizes down to 85 nm.

SourceLight Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS·JournalLight: Advanced Manufacturing·DateNov 30, 2023

The little things matter: Chemists develop new sensor for microvolume pH detection

Researchers at Xi'an Jiaotong-Liverpool University have developed a sensitive and robust pH sensor that can detect pH variation in just a few microliters of samples. The new sensor uses novel materials and methods to overcome the current method's limitations, which are not sensitive enough or fragile for commercial-scale use.

SourceXi'an Jiaotong-Liverpool University·JournalMicrochimica Acta·TypeExperimental study·DateNov 3, 2023
Garmin GPSMAP 67i with inReach

Garmin GPSMAP 67i with inReach provides rugged GNSS navigation, satellite messaging, and SOS for backcountry geology and climate field teams.

Accelerating aerial image simulations for optimal lithography

A research team from Taiwan has found a way to massively speed up aerial image simulations using wavelength scaling and fast Fourier transformation. The new algorithm improves computation speed by 4000-5000 times while maintaining only a slight intensity deviation.

SourceSPIE--International Society for Optics and Photonics·JournalJournal of Micro/Nanopatterning Materials and Metrology·DateJun 21, 2023

New procedure allows micro-printing inside existing materials with greater accuracy

Researchers at the University of Illinois have developed a new procedure, SCRIBE, that enables precise printing of microdevices into existing materials. The technique uses multiphoton lithography to selectively modify regions of the material's interior and manufacture custom small-scale optical devices.

SourceUniversity of Illinois Grainger College of Engineering·JournalACS Photonics·DateMay 10, 2023
Apple Watch Series 11 (GPS, 46mm)

Apple Watch Series 11 (GPS, 46mm) tracks health metrics and safety alerts during long observing sessions, fieldwork, and remote expeditions.

Fiber sensing scientists invent 3D printed fiber microprobe for measuring in vivo biomechanical properties of tissue and even single cell

Researchers at Shenzhen University have developed a compact fiber optical nanomechanical probe (FONP) to measure in vivo biomechanical properties of tissue and even single cells. The high-precision mechanical sensing system enables accurate measurements with spring constants as low as 2.1 nanonewtons.

SourceInternational Journal of Extreme Manufacturing·JournalInternational Journal of Extreme Manufacturing·DateFeb 10, 2023

Two-beam ultrafast laser scribing of ultrafine graphene patterns

Scientists develop two-beam ultrafast laser scribing technology to fabricate ultrafine graphene patterns with sub-diffraction feature size. The technique overcomes the diffraction limit barrier, allowing for precise control over patterned structures.

SourceUltrafast Science·JournalUltrafast Science·TypeExperimental study·DateFeb 9, 2023

Direct laser writing system for high-resolution, high-efficiency nanofabrication

A new parallel peripheral-photoinhibition lithography system has been developed, enabling the fabrication of subdiffraction-limit features with high efficiency. The system uses two beams to excite and inhibit polymerization, allowing for nonperiodic and complex patterns to be printed simultaneously.

SourceSPIE--International Society for Optics and Photonics·JournalAdvanced Photonics·DateDec 19, 2022

Large-area and high-precision fabrication of aspheric micro-lens array

Scientists have developed a novel fabrication method for large-area and high-precision aspheric micro-lens arrays via single beam exposure DLWL, enabling high flexibility in design. The approach produces AMLA with dimensions of 30 × 30 mm² within 8 hours, exceeding 100 mm²/h writing speed.

SourceLight Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS·JournalLight: Advanced Manufacturing·DateDec 11, 2022

Centimeter-scale multicolor printing with a pixelated optical cavity

Researchers have developed a method for centimeter-scale color printing using grayscale laser writing, achieving vivid and fine-tunable colors. The technique leverages pixelated optical cavities to generate transmission colors with a transmission efficiency of 39-50%.

SourceSPIE--International Society for Optics and Photonics·JournalAdvanced Photonics Nexus·DateNov 10, 2022
Sky-Watcher EQ6-R Pro Equatorial Mount

Sky-Watcher EQ6-R Pro Equatorial Mount provides precise tracking capacity for deep-sky imaging rigs during long astrophotography sessions.

New insights into nanochannel fabrication using femtosecond laser pulses

Researchers developed a novel method to create deep nanochannels in hard and brittle materials like silica, diamond, and sapphire. By employing femtosecond laser direct writing technology, they achieved sub-100-nm feature sizes and ultrahigh aspect ratios.

SourceSPIE--International Society for Optics and Photonics·JournalAdvanced Photonics Nexus·DateNov 2, 2022

Large-area and high-precision fabrication of aspheric micro-lens array

A team of scientists has developed a novel fabrication method for aspheric micro-lens arrays, enabling large-area and high-precision creation. The single beam exposure DLWL technology satisfies the high optical performance requirements.

SourceLight Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS·JournalLight: Advanced Manufacturing·DateSep 20, 2022

Overcoming a major manufacturing constraint

Researchers characterize material properties of IP-Q using Raman spectroscopy and nanoindentation, revealing elastic parameters and their effects on acoustic behavior. The study optimizes elastic parameters for TPP-fabricated structures, benefiting applications in life science, mobility, and industry.

SourceSPIE--International Society for Optics and Photonics·JournalJournal of Optical Microsystems·DateAug 12, 2022

Customized fiber generates Bessel beams

Customized fibers have been engineered to generate Bessel beams, opening up new applications in imaging and communications. The fibers use a technique called two-photon lithography to fabricate special beam-shaping elements, enabling the creation of compact Bessel beam generators.

SourceKing Abdullah University of Science & Technology (KAUST)·JournalOptica·DateAug 9, 2022
Apple iPad Pro 11-inch (M4)

Apple iPad Pro 11-inch (M4) runs demanding GIS, imaging, and annotation workflows on the go for surveys, briefings, and lab notebooks.

Rice ‘metalens’ could disrupt vacuum UV market

Researchers at Rice University have created a 'metalens' that transforms long-wave UV-A into a focused output of vacuum UV radiation. The technology uses nanophotonics to impart a phase shift on incoming light, redirecting it and generating VUV without the need for specialized equipment.

SourceRice University·JournalScience Advances·TypeExperimental study·DateMay 5, 2022

Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

Researchers developed a novel approach combining interference lithography and grayscale-patterned secondary exposure to create high-throughput nanopatterning on a wafer-scale area. This method enables precise control of feature sizes, overcoming challenges in mainstream approaches.

SourceLight Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS·JournalLight Science & Applications·DateApr 10, 2022

Vectorial metrics reveal complex optical information

Researchers developed a new framework to extract meaningful vectorial metrics from Mueller matrix elements, providing insights into exotic material characterization and precise cancer boundary detection. The framework establishes a universal metric for calculating different physical properties of target objects.

SourceSPIE--International Society for Optics and Photonics·JournalAdvanced Photonics·DateMar 29, 2022

Customized mix of materials for three-dimensional micro- and nanostructures

Scientists at KIT integrate a microfluidic chamber into a 3D laser lithography device to produce multi-colored, fluorescent security features from seven different materials. The system enables precise production of three-dimensional microstructured security features for applications such as banknote and document counterfeiting.

SourceKarlsruher Institut für Technologie (KIT)·JournalScience Advances·DateFeb 13, 2019
Creality K1 Max 3D Printer

Creality K1 Max 3D Printer rapidly prototypes brackets, adapters, and fixtures for instruments and classroom demonstrations at large build volume.

MIT reports finer lines for microchips

Researchers at MIT have achieved a significant advance in nanoscale lithographic technology, enabling the creation of finer patterns of lines over larger areas. The new technique has the potential to lead to commercialization of many new nanotechnology inventions that have languished due to manufacturing limitations.

SourceMassachusetts Institute of Technology·JournalOptics Letters·DateJul 8, 2008

Breakthrough computer chip lithography method developed at RIT

A new computer chip lithography method, evanescent wave lithography (EWL), has been developed at Rochester Institute of Technology, allowing for optically imaging the smallest-ever semiconductor device geometry. The breakthrough has enabled resolution smaller than one-twentieth the wavelength of visible light, surpassing previous limits.

SourceRochester Institute of Technology·DateFeb 10, 2006

Soft lithography used to fabricate transistors on curved substrates

Soft lithography enables fabrication of silicon thin-film transistors on curved substrates with conformable patterning. The technique overcomes photolithography limitations for large-format and unconventional materials applications.

SourceUniversity of Illinois at Urbana-Champaign, News Bureau·JournalChemistry of Materials·DateNov 2, 2000

Sandia Patents Extreme Ultraviolet Source

The Sandia invention enables research development of EUV lithography, patterning faster and more memory-dense microchips. This light source is brighter than synchrotron radiation and takes less space.

SourceDOE/Sandia National Laboratories·DateSep 16, 1997
CalDigit TS4 Thunderbolt 4 Dock

CalDigit TS4 Thunderbolt 4 Dock simplifies serious desks with 18 ports for high-speed storage, monitors, and instruments across Mac and PC setups.