The development of submicron light sources has long been a challenging yet crucial pursuit in various scientific and technological fields, from bioimaging to optogenetics and beyond. However, the fabrication of such high-resolution light sources often relies on complex and advanced micro-nano processing techniques, limiting their large-scale application. Now, researchers from the College of Physics and Information Engineering at Fuzhou University and the Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, led by Professor Chaoxing Wu, have proposed a novel and efficient method known as Shadow-Assisted Sidewall Emission (SASE) to achieve submicron linewidth light sources using only conventional UV photolithography. Their groundbreaking findings are published in Nano-Micro Letters .
Why SASE Matters
Innovative Design and Mechanisms
Future Outlook
Stay tuned for more exciting advancements from Professor Chaoxing Wu and his team as they continue to explore the potential of SASE and push the boundaries of micro light source technology!
Nano-Micro Letters
Experimental study
Shadow‑Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography
22-Apr-2025