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Ultra-high brightness Micro-LEDs with wafer-scale uniform GaN-on-silicon epilayers

10.17.24 | Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

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In recent years, the field of display technology has witnessed a paradigm shift towards GaN-based Micro-LEDs displays, representing a promising avenue for next-generation visual interfaces. Among the various colors crucial for achieving vibrant and energy-efficient displays, green stands out as particularly significant due to its essential role in accurate color reproduction and overall image quality. However, progress in green Micro-LEDs has been hindered by persistently low energy conversion efficiency, especially with small-size pixels. This limitation poses a significant obstacle in achieving a balanced color spectrum and a considerable overall brightness, crucial for delivering realistic and vibrant visuals in display technologies. In this term, manufacturing green Micro-LEDs with high brightness and high resolution is of great significance.

In a new paper published in Light Science & Applications, a team of scientists, led by Professors Anlian Pan and Dong Li from Hunan University, Changsha, China and co-workers have designed and grown wafer-scale uniform green GaN epilayer on a 4-inch/6-inch Si (111) substrate. This epilayer demonstrated a low dislocation density of 5.25×10 8 cm -2 , minimal wafer bowing of 16.7 μm, and high wavelength uniformity (STDEV<1 nm). Leveraging these advanced materials, they developed green Micro-LEDs with an impressive brightness exceeding 10 7 cd/m² (nits). Furthermore, the integration of Micro-LEDs with Si-based CMOS circuits enabled the realization of green Micro-LED displays with resolution up to 1080×780, achieving high-definition playback of movies and images. The work lays the foundation for the mass production of high brightness Micro-LED displays on large size GaN-on-Si epi-wafers.

These scientists summarized the highlights of the work as follows:

“(1) A gallium (Ga)-assisted method for AlN growth is proposed in this work to address the challenges of low-temperature preparation of high-quality AlN buffer layers on silicon substrates, resulting in the successful fabrication of high-quality GaN epilayers at the wafer scale. (2) A highly controllable roughening process combined with atomic-level sidewall passivation treatment is implemented, overcoming the bottleneck in Micro-LED luminous efficiency and enabling the production of ultra-high brightness Micro-LEDs. (3) Vertical non-alignment bonding technique is developed, which allows for the seamless integration of Micro-LED displays with Si-based CMOS drivers, achieving exceptional uniformity and high-resolution in micro-displays.”

The scientists further predicted: “With the rapid advancement of GaN-based micro-displays, future technological innovations could accelerate the arrival of the metaverse era.

10.1038/s41377-024-01639-3

Ultra-high brightness Micro-LEDs with wafer-scale uniform GaN-on-silicon epilayers

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WEI ZHAO
Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS
zhaowei@ciomp.ac.cn

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How to Cite This Article

APA:
Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS. (2024, October 17). Ultra-high brightness Micro-LEDs with wafer-scale uniform GaN-on-silicon epilayers. Brightsurf News. https://www.brightsurf.com/news/1ZZR2371/ultra-high-brightness-micro-leds-with-wafer-scale-uniform-gan-on-silicon-epilayers.html
MLA:
"Ultra-high brightness Micro-LEDs with wafer-scale uniform GaN-on-silicon epilayers." Brightsurf News, Oct. 17 2024, https://www.brightsurf.com/news/1ZZR2371/ultra-high-brightness-micro-leds-with-wafer-scale-uniform-gan-on-silicon-epilayers.html.