Photodetectors, serving as essential transducers that convert optical signals into electrical signals, are indispensable components in imaging, communications, and biomimetic applications. Although silicon-based materials are extensively utilized, they face inherent limitations such as low light absorption efficiency and insufficient mechanical flexibility. Perovskite materials have emerged as next-generation "star" materials due to their exceptional optoelectronic properties, including high carrier mobility and tunable bandgaps. However, the precise fabrication (patterning) of perovskite materials into desired micro/nanostructures represents a critical step and a significant technological challenge in realizing high-performance, integrated optoelectronic devices.
A research team led by Professor Dongming Sun at the Institute of Metal Research, Chinese Academy of Sciences (IMR, CAS), has comprehensively reviewed recent advances in perovskite thin-film patterning techniques for photodetector applications. Their work systematically compares five major patterning methodologies—including template-confined growth, inkjet printing, and others—detailing their underlying principles, advantages, and limitations. Significantly, they introduce the concept of "dimensional engineering," establishing a correlation between material performance and structural dimensionality across different scales.
The review elucidates the pivotal role of patterning technologies in enhancing key device performance metrics, such as sensitivity and response speed. It further highlights the breakthrough application potential of patterned perovskite devices in cutting-edge fields, notably flexible wearable health monitoring (e.g., pulse detection) and bio-inspired electrochemical eyes. This comprehensive analysis provides crucial guidance for the design and integration of perovskite-based optoelectronic devices.
Patterning Imperative
Precise control of perovskite morphology via microstructuring enhances light absorption, charge separation, and device stability. Patterning mitigates limitations of conventional films, such as inhomogeneous grain boundaries and environmental degradation.
Patterning Techniques
Device Integration
Patterned perovskites underpin photodetectors in diverse configurations:
Emerging Applications
Challenges Ahead
Scalability, environmental stability, and lead-free alternatives remain hurdles. Future work must integrate patterning with encapsulation technologies and explore sustainable materials to enable commercial adoption.
Recent progress in the patterning of perovskite films for photodetector applications