Background :
Lithography-based patterning has been instrumental in achieving the tremendous computational power and high device density of today's computer chips. Extreme ultraviolet (EUV) lithography, with a short wavelength of 13.5 nm, is being implemented for high-volume manufacturing, which is expected to reduce the number of patterning steps in the fabrication process flow and lower layout complexity by replacing multi‑patterning steps with single‑step EUV patterning. However, resists for EUV lithography impose rigorous requirements, including high optical absorption, high etch resistance, high sensitivity and resolution, and low line-edge roughness. Traditional carbon‑based resist materials fall short of meeting these requirements, so metal-containing organic‑inorganic hybrid resists are being investigated. These metal‑containing materials offer an increase in etch resistance due to the addition of more robust metal atoms into the polymeric backbone and improvement in line‑edge roughness due to the use of smaller molecules. Also, the addition of metals with high EUV absorption coefficients could be used to enhance resist sensitivity. Many avenues are being investigated to develop EUV resist materials containing metal atoms, such as metal oxide nanoparticles, metal-containing oxo‑cages, and metal‑containing salt complexes. However, all of these approaches either require the establishment of new infrastructure or have a limited shelf life.
Technology Overview :
Researchers at Stony Brook University (SBU) propose a new invention that provides improved methods for preparing resist materials for advanced lithography, using existing infrastructure and materials without the need for complex chemical synthesis. This method relies upon infiltrating certain metals such as Al, Zn, Sn, Ti, Zr, Hf, In, Sb, Co, Ni, Pd, W, Pt, Au, as well as their oxides into the thin films of resist materials such as poly(methyl methacrylate) (PMMA) and similar acrylate based resist derivatives, ZEP series, CSAR series, polysterene derivatives, and poly(2-vinylpyridine) derivatives to synthesize hybrid nanocomposite resists with enhanced properties. The infiltration of the metal or metal oxide can be carried out by vapor-phase infiltration using tools, including but not limited to an atomic layer deposition chamber, and/or by liquid-based infiltration using solutions of metallic salts. The synthesized hybrid resists can then undergo lithographic patterning and subsequent pattern transfer. The results support an easy-access, cost‑effective development route to high‑performance lithography resists.
Advantages :
Applications :
Intellectual Property Summary : 12,140,865
Stage of Development :
Licensing Status : Available
Licensing Potential : Development partner - Commercial partner - Licensing
About the Research Foundation for the State University of New York:
As the nation's largest research foundation supporting the nation's largest public university system, The Research Foundation for SUNY powers research and innovation to address today's most pressing problems and shape a better future for generations to come. The Research Foundations supports SUNY researchers leading the way globally in AI for the public good, quantum technologies, next-generation semiconductors, biotech and medicine, energy and climate solutions, and more. The Research Foundation for SUNY is a private, nonprofit educational corporation that is tax-exempt under Internal Revenue Code (IRC) Section 501(c)(3). To learn more, please visit us online at rfsuny.org .
About the State University of New York
The State University of New York is the largest comprehensive system of higher education in the United States, and more than 95 percent of all New Yorkers live within 30 miles of any one of SUNY’s 64 colleges and universities. Across the system, SUNY has four academic health centers, five hospitals, four medical schools, two dental schools, a law school, the country’s oldest school of maritime, the state's only college of optometry, 12 Educational Opportunity Centers, over 30 ATTAIN digital literacy labs, and manages one US Department of Energy National Laboratory. In total, SUNY serves about 1.7 million students across its portfolio of credit- and non-credit-bearing courses and programs, continuing education, and community outreach programs. SUNY oversees nearly a quarter of academic research in New York. Research expenditures system-wide are nearly $1.5 billion in fiscal year 2025, including significant contributions from students and faculty. There are more than three million SUNY alumni worldwide, and annually one in three New Yorkers who earn a college degree is a SUNY alum. To learn more about how SUNY creates opportunities, visit suny.edu .