Articles tagged with Electronic Lithography
NY Creates is part of a collaboration to advance high NA EUV lithography and transition to larger 6-by-12-inch mask format, enabling single-exposure printing of larger chip areas. This initiative aims to strengthen the industry's capabilities and support next-generation semiconductor innovation.
Researchers developed a compact, solid-state laser system that generates 193-nm coherent light, marking the first 193-nm vortex beam produced from a solid-state laser. This innovation enhances semiconductor lithography efficiency and opens new avenues for advanced manufacturing techniques.
The Nick Cobb Memorial Scholarship honors an exemplary graduate student in the field of lithography. Clay Klein, a PhD candidate at JILA and the University of Colorado, Boulder, will receive the $10,000 award for his research on EUV scatterometry and its applications.
Researchers developed a novel block copolymer that can create finely detailed structures on semiconductor chips with half-pitch sizes of less than 10 nanometers. The new compound achieves 7.6 nm line width, outperforming conventional block copolymers.
Researchers develop a novel method for epitaxial growth of 1D metallic materials with widths less than 1 nm, enabling ultra-miniaturized transistor devices. The technology shows promise for next-generation semiconductors and basic materials science.
Researchers at KAIST have developed a novel ultra-low power memory device that can replace existing memory or be used in implementing neuromorphic computing. The new phase change memory device consumes 15 times less power than conventional devices, enabling the development of low-cost and energy-efficient artificial intelligence hardware.
Researchers have developed a method called mask wafer co-optimization (MWCO) that allows for the creation of curved shapes using variable-shaped beam mask writers. This technique reduces wafer variation by 3x and improves the process window by 2x compared to existing methods.
The company will use the funding to develop a novel method to produce high-accuracy optical encoders, which are crucial for modern automation and robotics systems. The goal is to enable the manufacturing of complex next-generation products with precision positioning and motion control.
A research team from Taiwan has found a way to massively speed up aerial image simulations using wavelength scaling and fast Fourier transformation. The new algorithm improves computation speed by 4000-5000 times while maintaining only a slight intensity deviation.
Georgia Tech researchers developed a new nanoelectronics platform based on graphene, enabling smaller devices, higher speeds, and less heat. The platform may lead to the discovery of a new quasiparticle, potentially exploiting the elusive Majorana fermion.
A new parallel peripheral-photoinhibition lithography system has been developed, enabling the fabrication of subdiffraction-limit features with high efficiency. The system uses two beams to excite and inhibit polymerization, allowing for nonperiodic and complex patterns to be printed simultaneously.
A new technique allows printing electronic circuits onto curved and corrugated surfaces without binding agents, paving the way for soft electronic technologies. Prototype smart contact lenses, pressure-sensitive gloves, and transparent electrodes have been created using this method.
Researchers review emerging field of 2D ferroelectric materials with layered van-der-Waals crystal structures, offering new properties and functionalities not found in conventional materials. These materials show easily stackable nature, making them attractive as building blocks for post-Moore's law electronics.
Researchers at DTU have developed a new method for designing nanomaterials with unprecedented precision, allowing for the creation of compact and electrically tunable metalenses. This breakthrough enables the development of high-speed communication and biotechnology applications.
Scientists developed new AI-based tools to identify and study materials exhibiting a metal-insulator transition (MIT), which could lead to faster and more energy-efficient microelectronic devices. The tools provide a freely available database, online classifier, and new features for characterizing these materials.
The Sandia invention enables research development of EUV lithography, patterning faster and more memory-dense microchips. This light source is brighter than synchrotron radiation and takes less space.